Balint Meliorisz

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

Calibrated PSCAR stochastic simulation

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

Advanced fast 3D DSA model development and calibration for design technology co-optimization

Kafai Lai, Hans-Jürgen Stock, Ulrich Welling, 2017, Advanced Lithography.

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Geert Vandenberghe, Hans-Jürgen Stock, Kazuhiro Takeshita, 2018, Advanced Lithography.