M. Davidson

Model‐based CD–SEM metrology at low and ultralow landing energies: implementation and results for advanced IC manufacturing

D. Gorelikov, J. Remillard, N. Sullivan, 2005 .

A modal model for diffraction gratings

M. Davidson, 2002, physics/0209045.

Image sharpness measurement in scanning electron microscopy—part I

Michael T. Postek, Mark P. Davidson, Andrá E. Vladár, 2006 .

An Application Of Interference Microscopy To Integrated Circuit Inspection And Metrology

Mark P. Davidson, Kalman Kaufman, Isaac Mazor, 1987, Advanced Lithography.

Numerical reference models for optical metrology simulation

Egon Marx, Mark P. Davidson, Gregory L. Wojcik, 1992, Advanced Lithography.

Inverse scattering approach to SEM linewidth measurements

Andras E. Vladar, Mark P. Davidson, A. Vladár, 1999, Advanced Lithography.

Applications of image diagnostics to metrology quality assurance and process control

Alexander Starikov, James E. Potzick, Mark P. Davidson, 2003, SPIE Advanced Lithography.