Y. Sakuma

发表

Fast Deposition of Microcrystalline Silicon Using High-Density SiH4 Microwave Plasma

Hajime Shirai, Hiroyuki Ueyama, H. Shirai, 1999 .

Optical emission spectroscopy study toward high rate growth of microcrystalline silicon

H. Shirai, K. Azuma, Y. Sakuma, 2001 .

Spatial distribution of high-density microwave plasma for fast deposition of microcrystalline silicon film

H. Shirai, Y. Sakuma, Koichi Yoshino, 2001 .

Relief of spin frustration through magnetic anisotropy in the quasi-one-dimensional S=12 antiferromagnet

R. Mole, S. Okubo, Y. Sakuma, 2022, Physical Review B.

Fast Deposition of Microcrystalline Silicon Films Using The High-Density Microwave Plasma Utilizing a Spokewise Antenna

H. Shirai, Y. Sakuma, Koichi Yoshino, 2000 .

The high-density microwave plasma for high rate deposition of microcrystalline silicon

H. Shirai, Y. Sakuma, H. Ueyama, 1999 .

Growth kinetics of nanocrystalline silicon from SiH2Cl2 by plasma-enhanced chemical vapor deposition

H. Shirai, Y. Sakuma, Yoshimizu Moriya, 2000 .

Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma

Haiping Liu, H. Shirai, Y. Sakuma, 2001 .

Spatial Distribution of the High-Density Microwave Plasma and Its Effect on Crystal Silicon Film Growth

H. Shirai, Y. Sakuma, Koichi Yoshino, 2000 .

High-density microwave plasma for high-rate and low-temperature deposition of silicon thin film

H. Shirai, L. Haiping, Y. Sakuma, 2000 .