Yasuyuki Nakajima

发表

New advanced BARC and gap fill materials based on sublimate reduction for 193nm lithography

Satoshi Takei, Yusuke Horiguchi, Tetsuya Shinjo, 2006, SPIE Advanced Lithography.

Thin film type 248-nm bottom antireflective coatings

Yasuyuki Nakajima, Tomoyuki Enomoto, Keisuke Nakayama, 2003, SPIE Advanced Lithography.

Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyses

C. Grant Willson, Satoshi Takei, Yasuyuki Nakajima, 2009, Advanced Lithography.

Thin film and high-etch-rate type 248-nm bottom antireflective coatings

Rikimaru Sakamoto, Satoshi Takei, Yasuyuki Nakajima, 2004, SPIE Advanced Lithography.

New chemical approach for resist poisoning problem in via first dual-damascene process

Satoshi Takei, Tetsuya Shinjo, Yasuyuki Nakajima, 2006, SPIE Advanced Lithography.

New 193-nm bottom anti-reflective coatings

Rikimaru Sakamoto, Yasuyuki Nakajima, Keisuke Nakayama, 2003, SPIE Advanced Lithography.

Novel approach of UV cross-link process for advanced planarization technology in 32-45 nm lithography

Satoshi Takei, Yusuke Horiguchi, Tetsuya Shinjo, 2007, SPIE Advanced Lithography.

Impact of BARC on SEM shrinkage of ArF resist

Sang-Gyun Woo, Hyun-Woo Kim, Yasuyuki Nakajima, 2004, SPIE Advanced Lithography.

Ultraviolet cross-link process using spin-coating materials for advanced planarization and sublimate defect reduction

Satoshi Takei, Yusuke Horiguchi, Yasuyuki Nakajima, 2008, NanoScience + Engineering.

Method for intrinsic crosstalk reduction on a serial array of interferometric optical fiber hydrophones based on fiber Bragg gratings

Yasuyuki Nakajima, Kenji Saijyou, Tomonao Okuyama, 2015 .

Development of organic bottom antireflective coating for 157-nm lithography

Toshiro Itani, Rikimaru Sakamoto, Yasuyuki Nakajima, 2003, SPIE Advanced Lithography.

A New Noise Reduction System

Yoshinobu Kitamura, Yasuyuki Nakajima, Toshikazu Hamasaki, 1991, 1991 IEEE International Conference on Consumer Electronics.

Wet-recess gap-fill materials for an advanced dual damascene process

Satoshi Takei, Yusuke Horiguchi, Tetsuya Shinjo, 2007, SPIE Advanced Lithography.

Advanced ultraviolet cross-link process and materials for global planarization

Satoshi Takei, Yusuke Horiguchi, Yasuyuki Nakajima, 2008, SPIE Advanced Lithography.

Wet developable bottom antireflective coatings

Shigeo Kimura, Yasuyuki Nakajima, Tomoyuki Enomoto, 2004, SPIE Advanced Lithography.

ARC and gap fill material with high etch rate for advanced dual damascene process

Satoshi Takei, Anwei Qin, Tetsuya Shinjo, 2005, SPIE Advanced Lithography.

New polymer platform of BARC for ArF lithography

Young Ho Kim, Rikimaru Sakamoto, Daisuke Maruyama, 2005, SPIE Advanced Lithography.

A Study on Tile Size Conversion Transcoder of JPEG 2000

Masayuki Hashimoto, Yasuyuki Nakajima, Kiichi Hiromasa, 2004 .

High-etch-rate bottom-antireflective coating and gap-fill materials using dextrin derivatives in via first dual-damascene lithography process

Satoshi Takei, Keisuke Hashimoto, Tetsuya Shinjo, 2008, SPIE Advanced Lithography.

Developer-soluble gap fill materials for patterning metal trenches in via-first dual-damascene process

Satoshi Takei, Yasushi Sakaida, Yasuyuki Nakajima, 2004, SPIE Advanced Lithography.

Bottom anti-reflective coatings for 193-nm bilayer system

Yasuyuki Nakajima, Tomoyuki Enomoto, Takahiro Sakaguchi, 2005, SPIE Advanced Lithography.

Optimization of 248nm bottom anti-reflective coatings with thin film and high etch rate on real device

Hak-Joon Kim, Myoung-Soo Kim, Yasuyuki Nakajima, 2005, SPIE Advanced Lithography.

Interferometer fiber optic sensor for dc signal measurement

Koji Dobashi, Yasuyuki Nakajima, Ryotaku Sato, 2001, Optical Engineering for Sensing and Nanotechnology.

Property of Antiskid Devices equipped within a Gap of Dual Pneumatic Tires

Yasuyuki Nakajima, Kouichi Kojo, 2004 .