D. He

Image formation in EUV lithography: Multilayer and resist properties

Mumit Khan, Harun H. Solak, Srinivas B. Bollepalli, 2000 .

Extreme ultraviolet and x-ray resist: Comparison study

F. Cerrina, H. Solak, F. Cerrina, 1999 .

Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography

Harun H. Solak, Paul F. Nealey, Byeong-Hyeok Sohn, 1999 .

A new beamline for EUV lithography research

Harun H. Solak, J. Wallace, Francesco Cerrina, 2001 .

Process dependence of roughness in a positive-tone chemically amplified resist

F. Cerrina, F. Cerrina, D. He, 1998 .

Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces

F. Cerrina, H. Solak, F. Cerrina, 1999 .