Avinoam Kornblit

Plasma etching: Yesterday, today, and tomorrow

Vincent M. Donnelly, V. M. Donnelly, A. Kornblit, 2013 .

Marks for SCALPEL® tool optics optimization

Gregg M. Gallatin, Myrtle I. Blakey, Isik C. Kizilyalli, 2000 .

Effects of plasma conditions on the shapes of features etched in Cl2 and HBr plasmas. I. Bulk crystalline silicon etching

M. V. Malyshev, D. B. Graves, Vincent M. Donnelly, 1998 .

Spatial light modulator for maskless optical projection lithography

Nagesh R. Basavanhally, J. F. Miner, J. E. Bower, 2006 .

A multilayer inorganic antireflective system for use in 248 nm deep ultraviolet lithography

Raymond A. Cirelli, C. S. Pai, Fred P. Klemens, 1996 .