Patrick Kearney

Employing a detailed compositional analysis to develop a low defect Mo/Si deposition tool and process for EUVL mask blanks

Toshiyuki Uno, Andy Ma, Eberhard Spiller, 2006 .

Native blank defect analysis for the study of printability

Kenneth A. Goldberg, Sungmin Huh, Iacopo Mochi, 2010 .

Progress in the fabrication of low-defect density mask blanks for extreme ultraviolet lithography

Paul B. Mirkarimi, Andy Ma, Eberhard Spiller, 2006 .

EUV Research Activity at SEMATECH

Mark Neisser, Long He, A. Antohe, 2014 .