Jay Burnham

Wavelength-dependent spot defects on advanced embedded attenuated phase-shift masks

Louis Kindt, Christopher Magg, Jason M. Benz, 2004, SPIE Photomask Technology.

Ultrathin (8-14 nm) Conformal SiN for sub-20 nm Copper/Low-k Interconnects

Daniel C. Edelstein, Alfred Grill, Jay Burnham, 2014 .

Sulfur-free cleaning strategy for advanced mask manufacturing

Andrew J. Watts, Louis Kindt, Jay Burnham, 2006, SPIE Photomask Technology.

A benchmark investigation on cleaning photomasks using wafer cleaning technologies

Louis Kindt, Jay Burnham, Pat Marmillion, 2004, SPIE Photomask Technology.

Wavelength dependent mask defects

Andrew J. Watts, Tom Faure, Karen D. Badger, 2005, SPIE Advanced Lithography.

The combined effects of deuterium anneals and deuterated barrier-nitride processing on hot-electron degradation in MOSFET's

Terence B. Hook, Jay Burnham, Steven W. Mittl, 1999 .