W. Manders

The impact of scaling on hot-carrier degradation and supply voltage of deep-submicron NMOS transistors

H. Lifka, R. Woltjer, G. Streutker, 1991, International Electron Devices Meeting 1991 [Technical Digest].

A half-micron CMOS technology using ultra-thin silicon on insulator

P.H. Woerlee, H. Lifka, P. Sheridan, 1990, International Technical Digest on Electron Devices.