Erik A. Edelberg

发表

Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor

Eray S. Aydil, Vahid Vahedi, E. Aydil, 2002 .

Silicon hydride composition of plasma-deposited hydrogenated amorphous and nanocrystalline silicon films and surfaces

R. L. Naone, Eray S. Aydil, E. Aydil, 1998 .

Compact floating ion energy analyzer for measuring energy distributions of ions bombarding radio-frequency biased electrode surfaces

Eray S. Aydil, E. Aydil, Erik A. Edelberg, 1999 .

Modeling of SiO2 deposition in high density plasma reactors and comparisons of model predictions with experimental measurements

Sang M. Han, Ellen Meeks, Christopher A. Apblett, 1998 .

Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition

R. L. Naone, Eray S. Aydil, E. Aydil, 1996 .

Effect of H2 dilution on the surface composition of plasma-deposited silicon films from SiH4

E. Aydil, R. Naone, D. Marra, 1998 .

Luminescence from plasma deposited silicon films

E. Aydil, R. Naone, Erik A. Edelberg, 1997 .

New diagnostic method for monitoring plasma reactor walls: Multiple total internal reflection Fourier transform infrared surface probe

E. Aydil, V. Vahedi, Erik A. Edelberg, 2001 .

Modeling of the sheath and the energy distribution of ions bombarding rf-biased substrates in high density plasma reactors and comparison to experimental measurements

E. Aydil, Erik A. Edelberg, 1999 .

Profile simulation of high aspect ratio contact etch

E. Hudson, Erik A. Edelberg, D. Cooperberg, 2005 .

Energy distribution of ions bombarding biased electrodes in high density plasma reactors

E. Aydil, Erik A. Edelberg, N. Benjamin, 1999 .