Ki-Tae Park

Plasma assisted molecular beam epitaxy of ZnO on c -plane sapphire: Growth and characterization

Takafumi Yao, Ziqiang Zhu, Kenji Hiraga, 1998 .

A novel doping technology for ultra-shallow junction fabrication : boron diffusion from boron-adsorbed layer by rapid thermal annealing

Mitsumasa Koyanagi, Hiroyuki Kurino, Kazuhiro Hane, 2000 .