Jörg Butschke

A new approach to determine development model parameters by employing the isotropy of the development process

Joachim N. Burghartz, Mathias Irmscher, Corinna Kaspar, 2017 .

Bridging the gap between optical fibers and silicon photonic integrated circuits.

Manfred Berroth, Joachim Burghartz, Florian Letzkus, 2014, Optics express.

CMOS-compatible nonuniform grating coupler with 86% coupling efficiency

Manfred Berroth, Florian Letzkus, Wissem Sfar Zaoui, 2013 .

Influence of Silicon on Insulator Wafer Stress Properties on Placement Accuracy of Stencil Masks.

Albrecht Ehrmann, Hans Loschner, Ernst Haugeneder, 2002 .

Dry etch processes for the fabrication of EUV masks

Mathias Irmscher, Corinna Koepernik, Guenther Ruhl, 2004 .

Megahertz operation of flexible low-voltage organic thin-film transistors

Joachim N. Burghartz, Ute Zschieschang, Hagen Klauk, 2013 .

Cost-effective CMOS-compatible grating couplers with backside metal mirror and 69% coupling efficiency.

Manfred Berroth, Florian Letzkus, Wissem Sfar Zaoui, 2012, Optics express.