S. Kadlec

Discharge characteristics of a facing target sputtering device using unbalanced magnetrons

G. K. Muralidhar, J. Musil, S. Kadlec, 1996 .

An unbalanced magnetron sputtering device for low and medium pressures

G. K. Muralidhar, J. Musil, G. Muralidhar, 1995 .

Mechanism of the film composition formation during magnetron sputtering of WTi

Vratislav Peřina, L. R. Shaginyan, A. Macková, 2001 .

Energy and mass spectra of ions in triode ion plating of Ti(C,N) coatings

Lambert Stals, Milos Nesladek, Carl Quaeyhaegens, 1995 .

Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization

J. Musil, J. Musil, W. Münz, 1991 .