Nan Wu

Effect of surface NH3 anneal on the physical and electrical properties of HfO2 films on Ge substrate

Albert Chin, D.S.H. Chan, Narayanan Balasubramanian, 2004 .

Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH/sub 3/ and thin AlN) and TaN/HfO/sub 2/ gate stack

Fei Gao, Fei Gao, D. Kwong, 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..

Alternative surface passivation on germanium for metal-oxide-semiconductor applications with high-k gate dielectric

Albert Chin, D.S.H. Chan, Narayanan Balasubramanian, 2004 .

Drive-Current Enhancement in Ge n-Channel MOSFET Using Laser Annealing for Source/Drain Activation

Minghui Hong, Qingchun Zhang, Guoxin Chen, 2006, IEEE Electron Device Letters.

Formation and Thermal Stability of Nickel Germanide on Germanium Substrate

Qingchun Zhang, Lakshmi Kanta Bera, Chunxiang Zhu, 2005 .