A. Y. Du

Effect of surface NH3 anneal on the physical and electrical properties of HfO2 films on Ge substrate

Albert Chin, D.S.H. Chan, Narayanan Balasubramanian, 2004 .

Phase change random access memory cell with superlattice-like structure

Tow Chong Chong, X. S. Miao, Rong Zhao, 2006 .

FIB sample preparation for TEM failure analysis of advanced devices

C. Q. Chen, Y. N. Hua, C. Chen, 2010, 2010 17th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits.

Effect of Ta migration from sidewall barrier on leakage current in Cu/SiOCH low-k dielectrics

Chee Lip Gan, A. Y. Du, C. K. Cheng, 2009 .

Effect of plasma process on low-k material and barrier layer performance

L. Y. Wong, W. D. Wang, Dongzhi Chi, 2006 .

Dielectric degradation mechanism for copper interconnects capped with CoWP

Chee Lip Gan, Jeffrey P. Gambino, J. Gambino, 2008 .