M. J. Rand

Bilevel high resolution photolithographic technique for use with wafers with stepped and/or reflecting surfaces

R. G. Vadimsky, K. L. Tai, M. Rand, 1979 .

Radiation-Insensitive Silicon Oxynitride Films for Use in Silicon Devices---Part II

M. Rand, P. F. Schmidt, J. Mitchell, 1969 .