Masashi Okada

Stencil reticle repair for electron beam projection lithography

Sumito Shimizu, Shintaro Kawata, Takashi Kaito, 2000 .

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.

Masanobu Hasegawa, Akiyoshi Suzuki, Masahito Niibe, 2007, Applied optics.

High-precision wafer-level Cu-Cu bonding for 3DICs

Toshimasa Shimoda, Kazuya Okamoto, Hidehiro Maeda, 2014, 2014 IEEE International Electron Devices Meeting.

EUVA’s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2006 .