Masami Kakuchi

Polypyrrole-based conducting polymer alloy films: physical properties and film morphology

Toshiaki Tamamura, Osamu Niwa, T. Tamamura, 1987 .

An X-ray mask using SiC membrane deposited by ECR plasma CVD

Hideo Yoshihara, Shigehisa Ohki, Takashi Ohkubo, 1990 .

Poly (Fluoro Methacrylate) as Highly Sensitive, High Contrast Positive Resist

Kei Murase, K. Matsuyama, Masami Kakuchi, 1977 .

Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs

Hideo Yoshihara, Akira Ozawa, Masatoshi Oda, 1989 .