F. Weilnboeck

发表

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2008 .

On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists

Robert L. Bruce, Carlton G Willson, Gottlieb S. Oehrlein, 2011 .

Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2009 .

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

David B. Graves, Robert L. Bruce, C. G. Willson, 2010 .

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2010 .

Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer

Robert L. Bruce, Sebastian Engelmann, Sandra C. Hernández, 2015 .

Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions

David B. Graves, Gottlieb S. Oehrlein, D. Graves, 2012 .

Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening

David B. Graves, Robert L. Bruce, Gottlieb S. Oehrlein, 2010 .