V. Shamamian

发表

Combustion chemistry in premixed C2F4O2 flames

J. R. Mcdonald, H. Ladouceur, C. Douglass, 1995 .

Characterization of the CH4/H2/Ar high density plasma etching process for ZnSe

C. Eddy, V. Shamamian, D. Leonhardt, 2001 .

Electronic Structure and Potential Reactivity of Silaaromatic Molecules.

M. Ratner, G. Schatz, T. Marks, 2016, The journal of physical chemistry. A.

Decomposition of trimethylgallium on the gallium‐rich GaAs (100) surface: Implications for atomic layer epitaxy

B. D. Kay, K. Lykke, J. R. Creighton, 1990 .

Treatment of methyl tert-butyl ether contaminated water using a dense medium plasma reactor: a mechanistic and kinetic investigation.

D. Dandy, J. Callahan, S. Manolache, 2003, Environmental science & technology.

Plasma Polymerization of Thin Films: Correlations between Plasma Chemistry and Thin Film Character

F. Denes, D. Hinshelwood, V. Shamamian, 2002 .

Advanced chemical vapor deposition silicon carbide barrier technology for ultralow permeability applications

M. Loboda, V. Shamamian, U. Pernisz, 2006 .

Surface chemistry and damage in the high density plasma etching of gallium arsenide

C. Eddy, O. Glembocki, R. Holm, 1998 .

Using Ni masks in inductively coupled plasma etching of high density hole patterns in GaN

C. Eddy, R. Henry, R. Holm, 2005 .

Advanced Roll-to-Roll Plasma-Enhanced CVD Silicon Carbide Barrier Technology for Protection from Detrimental Gases†

M. Loboda, V. Shamamian, K. Weidner, 2011 .

Determining Compositional Variation in Silicon–Metal Alloys by Parsing SEM/EDS Hyperspectral Images

J. Sootsman, V. Shamamian, Jeremy M. Beebe, 2021, Microscopy and Microanalysis.

Mass Spectrometric Characterization of Pulsed Inductively Coupled Plasmas for Deposition of Thin Polyethylene Glycol-like Polymer Films

S. Manolache, F. Denes, D. Hinshelwood, 2001 .

Dense medium plasma synthesis of carbon/iron-based magnetic nanoparticle system

B. Ravel, S. Manolache, S. Prokes, 2003 .

Measurements of Argon Metastables in a High Density Processing Plasma

Richard F. Fernsler, R. Fernsler, V. Shamamian, 1997 .

Characterization of high density CH4/H2/Ar plasmas for compound semiconductor etching

C. Eddy, V. Shamamian, D. Leonhardt, 1999 .

Development of a tubular high-density plasma reactor for water treatment.

D. Dandy, V. Shamamian, Derek C. Johnson, 2006, Water research.

Dense medium plasma-plasma-enhanced decontamination of water of aromatic compounds

Sorin Manolache, S. Manolache, F. Denes, 2004 .

Kinetic effects in the chemistry of diamond CVD source gases and implications for diamond growth

R. Sinkovits, C. DeVore, V. Shamamian, 1996 .

Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process

J. Butler, C. Eddy, S. Pang, 1997 .

Characterization of Cl2/Ar high density plasmas for semiconductor etching

C. Eddy, V. Shamamian, D. Leonhardt, 1999 .

Guided resonances in asymmetrical GaN photonic crystal slabs observed in the visible spectrum.

Shouyuan Shi, Dennis Prather, Mijin Kim, 2005, Optics express.

GaN-based photonic crystals and integrated optics

C. Eddy, K. Bussmann, R. Henry, 2006, 2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference.

Dense medium plasma environments: a new approach for the disinfection of water.

S. Manolache, F. Denes, V. Shamamian, 2001, Environmental science & technology.

Measurements of neutral plasma species in an argon/isopropyl alcohol plasma for the deposition of organic films

R. Fernsler, V. Shamamian, D. Guerin, 2003 .

20 nm linewidth platinum pattern fabrication using conformal effusive‐source molecular precursor deposition and sidewall lithography

David S. Y. Hsu, V. Shamamian, N. H. Turner, 1992 .

Multi-scale Modeling of Quasi-directional Solidification of a Cast Si-Rich Eutectic Alloy

V. Shamamian, S. Mosbah, Andres E. Becerra, 2017 .