S.J. Fang

Control of dielectric chemical mechanical polishing (CMP) using an interferometry based endpoint sensor

S.J. Fang, A. Barda, T. Janecko, 1998, Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat. No.98EX102).

Sub-100 nm gate length metal gate NMOS transistors fabricated by a replacement gate process

G.A. Brown, A. Chatterjee, M. Rodder, 1997, International Electron Devices Meeting. IEDM Technical Digest.

CMOS metal replacement gate transistors using tantalum pentoxide gate insulator

G.A. Brown, A. Chatterjee, M. Rodder, 1998, International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217).