Yukiko Kikuchi

Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1× X-Ray Masks

Hajime Aoyama, Kenichi Saito, Tetsuo Morosawa, 2000 .

Comparison of Resist Family Outgassing Characterization between EUV and EB

Soichi Inoue, Hiroyuki Tanaka, Toshiya Takahashi, 2013 .

Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication.

Hajime Aoyama, Kenichi Saito, Tetsuo Morosawa, 2000 .

Comparison of Resist Outgassing Characterization between High Power EUV and EB

Soichi Inoue, Hiroyuki Tanaka, Toshiya Takahashi, 2012 .

Estimation of diffusion lengths of acid and quencher in chemically amplified resist on the basis of extreme ultraviolet exposure results

Yuusuke Tanaka, Iwao Nishiyama, Doo-Hoon Goo, 2007 .

Analysis of Sub-0.15 µm Pattern Replicationin Synchrotron Radiation Lithography

Hiroshi Nomura, Yoshio Gomei, Yukiko Kikuchi, 1993 .

Progress in EUV resist development

Iwao Nishiyama, Koichi Fujiwara, Tsutomu Shimokawa, 2007 .