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Metrology Challenges for 45 nm Strained‐Si Devices

R. Powers, Aaron Thean, Victor H. Vartanian, 2005 .

Dual-metal gate CMOS with HfO2 gate dielectric

P. Abramowitz, J. Conner, E. Luckowski, 2002, Digest. International Electron Devices Meeting,.

Optimization of Hafnium Zirconate (HfZrOx) Gate Dielectric for Device Performance and Reliability

E. Luckowski, C. Capasso, S. Kalpat, 2006 .

Challenges for the integration of metal gate electrodes

S. Samavedam, E. Luckowski, C. Capasso, 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..

Embedded SiGe S/D PMOS on thin body SOI substrate with drive current enhancement

M. Mendicino, S. Murphy, S. Venkatesan, 2005, Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005..