Hyoungsub Kim

发表

Atomic layer deposition of ZrO2 on W for metal-insulator-metal capacitor application

Krishna C. Saraswat, Paul C. McIntyre, K. Saraswat, 2003 .

Simultaneous plasma and thermal treatments of ITO surfaces for organic solar cells.

Heeyeop Chae, Donggeun Jung, Jungwoo Kim, 2011, Journal of nanoscience and nanotechnology.

Local epitaxial growth of ZrO2 on Ge (100) substrates by atomic layer epitaxy

Krishna C. Saraswat, Chi On Chui, Paul C. McIntyre, 2003 .

Thin Film Transistor Using Amorphous InGaZnO Films as Both Channel and Source/Drain Electrodes

Jang-Yeon Kwon, Juyun Choi, Kyung Ah Park, 2011 .

Resistive switching characteristics of solution-deposited Gd, Dy, and Ce-doped ZrO2 films

Hyoungsub Kim, C. An, S. Choi, 2012 .

Dynamic study on microstructural evolution of nickel germanide utilizing zirconium interlayer

Cheol-Woong Yang, Hyung-Kyu Kim, Min-Ho Park, 2012 .

Interfacial characteristics of HfO2 grown on nitrided Ge (100) substrates by atomic-layer deposition

Krishna C. Saraswat, Chi On Chui, Paul C. McIntyre, 2004 .

Engineering chemically abrupt high-k metal oxide∕silicon interfaces using an oxygen-gettering metal overlayer

Krishna C. Saraswat, Chi On Chui, Susanne Stemmer, 2004 .

Ultrasensitive Room-Temperature Operable Gas Sensors Using p-Type Na:ZnO Nanoflowers for Diabetes Detection.

Tae-Jun Ha, Yong-Hoon Kim, Rawat Jaisutti, 2017, ACS applied materials & interfaces.

Improved growth behavior of atomic-layer-deposited high-k dielectrics on multilayer MoS2 by oxygen plasma pretreatment.

Woong Choi, Mann-Ho Cho, Sunkook Kim, 2013, ACS applied materials & interfaces.

Evenly transferred single-layered graphene membrane assisted by strong substrate adhesion

Seongjun Park, Hyunwoo Ha, Yunseok Kim, 2017, Nanotechnology.

Thickness scaling of atomic-layer-deposited HfO2 films and their application to wafer-scale graphene tunnelling transistors

Seongjun Park, Sungwoo Hwang, Seong-Jun Jeong, 2016, Scientific Reports.

Solution-processed InGaZnO-based thin film transistors for printed electronics applications

Jong Hyun Shim, Jun Hyuk Choi, Jinho Joo, 2009 .

High-performance EEPROMs using N- and P-channel polysilicon thin-film transistors with electron cyclotron resonance N 2 O-plasma oxide

Chul-Hi Han, Nae-In Lee, N. Lee, 1999 .

Effects of Urban Heat Island mitigation in various climate zones in the United States

Hwan Yong Kim, Donghwan Gu, Hyoungsub Kim, 2018, Sustainable Cities and Society.

A sub-400/spl deg/C germanium MOSFET technology with high-/spl kappa/ dielectric and metal gate

Chi On Chui, C. O. Chui, K. Saraswat, 2002, Digest. International Electron Devices Meeting,.

Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics

Paul C. McIntyre, Stacey F. Bent, S. Bent, 2004 .

A germanium NMOSFET process integrating metal gate and improved hi-/spl kappa/ dielectrics

Chi On Chui, C. O. Chui, K. Saraswat, 2003, IEEE International Electron Devices Meeting 2003.

MoS2-InGaZnO Heterojunction Phototransistors with Broad Spectral Responsivity.

Yong-Hoon Kim, Seongjun Park, Jeong Ho Cho, 2016, ACS applied materials & interfaces.

Assessment of silicon MOS and carbon nanotube FET performance limits using a general theory of ballistic transistors

Jing Guo, S. Datta, M. Brink, 2002, Digest. International Electron Devices Meeting,.

Germanium nanowire field-effect transistors with SiO2 and high-κ HfO2 gate dielectrics

Qian Wang, Krishna C. Saraswat, Hongjie Dai, 2003 .