Dana L. Durham

Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions

Munirathna Padmanaban, Ralph R. Dammel, M. D. Rahman, 1999, Advanced Lithography.

Lithographic performance of a dry-etch stable methacrylate resist at 193 nm

Munirathna Padmanaban, Ralph R. Dammel, Stanley A. Ficner, 1998, Advanced Lithography.

Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions

Munirathna Padmanaban, Ralph R. Dammel, Woo-Kyu Kim, 1999, Advanced Lithography.

Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems

Munirathna Padmanaban, Ralph R. Dammel, Michelle M. Cook, 1999, Other Conferences.