Hidehiro Watanabe

Impact of electron scattering in extreme ultraviolet reflective multilayer on electron image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Simulation technique for pattern inspection using a projection electron microscope

Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, 2015 .

A 0.67 /spl mu/m/sup 2/ self-aligned shallow trench isolation cell (SA-STI cell) for 3 V-only 256 Mbit NAND EEPROMs

Shigeyoshi Watanabe, Fujio Masuoka, Seiichi Aritome, 1994, Proceedings of 1994 IEEE International Electron Devices Meeting.

Analysis of image distortion on projection electron microscope image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2014 .

Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability

Tsuneo Terasawa, Tsuyoshi Amano, Takeshi Yamane, 2013 .

An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects

Ryoichi Hirano, Susumu Iida, Kaoru Ohya, 2016 .

Identification of residual-type defect on extreme ultraviolet mask by projection electron microscope using Monte Carlo simulation

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .

Residual-type mask defect printability for extreme ultraviolet lithography

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .