C. Licoppe

发表

Differences in the SiO2/InP interfaces obtained by thermal and UV-induced chemical vapour deposition

J. Flicstein, Y. I. Nissim, J. M. Moison, 1992 .

Imaging of the optical mode of waveguiding devices by scanning near‐field optical microscopy

S. Davy, A. Bruno, B. Mersali, 1995 .

UV annealing of low temperature photodeposited SiO2 films with a new powerful lamp source

J. Flicstein, C. Licoppe, J. Flicstein, 1992 .

Near-field optical imaging of light propagation in semiconductor waveguide structures

F. Mignard, A. C. Boccara, M. Allovon, 1998 .

A combination of rapid thermal processing and photochemical deposition for the growth of SiO2 suitable for InP device applications

J. Flicstein, Y. I. Nissim, C. Licoppe, 1990 .

Paramagnetic Defect Analysis in UV Lamp Induced Chemical Vapour Deposited a-SiO 2 Films

J. Flicstein, C. Licoppe, C. Debauche, 1992 .

Imaging and local infrared spectroscopy with a near field optical microscope

C. Licoppe, F. Creuzet, A. Piednoir, 1996 .