C. Debauche

Differences in the SiO2/InP interfaces obtained by thermal and UV-induced chemical vapour deposition

J. Flicstein, Y. I. Nissim, J. M. Moison, 1992 .

UV annealing of low temperature photodeposited SiO2 films with a new powerful lamp source

J. Flicstein, C. Licoppe, J. Flicstein, 1992 .

Cu surface treatment influence on Si adsorption properties of CuSiN self-aligned barriers for sub-65nm technology node

S. Chhun, J. Michelon, L. Pinzelli, 2006 .

Paramagnetic Defect Analysis in UV Lamp Induced Chemical Vapour Deposited a-SiO 2 Films

J. Flicstein, C. Licoppe, C. Debauche, 1992 .