A. Mahan

发表

Structural changes in a-Si:H film crystallinity with high H dilution

Don L. Williamson, Subhendu Guha, A. H. Mahan, 2000 .

Structural, defect, and device behavior of hydrogenated amorphous Si near and above the onset of microcrystallinity

S. Guha, Jeffrey Yang, D. L. Williamson, 1999 .

On the influence of short and medium range order on the material band gap in hydrogenated amorphous silicon

Bicai Pan, Don L. Williamson, A. H. Mahan, 2004 .

Protocrystalline Silicon at High Rate from Undiluted Silane

R. Schropp, C.H.M. van der Werf, M. K. V. Veen, 2004 .

Structural changes in a-Si:H films deposited on the edge of crystallinity

S. Guha, Jeffrey Yang, D. L. Williamson, 1999 .

Observation of Improved Structural Ordering in Low H Content, Hot wire Deposited a-Si:H

T. Furtak, D. L. Williamson, A. Mahan, 1997 .

Optical determination of the mass density of amorphous and microcrystalline silicon layers with different hydrogen contents

M. Vaněček, Z. Remeš, P. Torres, 1998 .

Hydrogen adsorption in single-walled and multi-walled carbon nanotubes grown in a hot-wire CVD (Cat-CVD) reactor

R. Deshpande, A. Dillon, J. Alleman, 2006 .

Film quality in relation to deposition conditions of a‐SI:H films deposited by the ‘‘hot wire’’ method using highly diluted silane

E. Molenbroek, A. Gallagher, A. Mahan, 1996 .

The effect of film tensile stress on crystallite nucleation and growth in thermally annealed a-Si:H

D. M. Piper, W. Nemeth, A. Mahan, 2014 .

Nucleation rate reduction through stress relief of thermally annealed hydrogenated amorphous silicon films

D. Ginley, M. V. Hest, A. Mahan, 2013 .

Identification of Nucleation Center Sites in Thermally Annealed Hydrogenated Amorphous Silicon

L. Gedvilas, S. P. Ahrenkiel, D. L. Williamson, 2009 .

A comparison of grain nucleation and grain growth during crystallization of HWCVD and PECVD a-Si:H films

D. Ginley, R. Schropp, H. Li, 2008 .

Growth of epitaxial silicon at low temperatures using hot-wire chemical vapor deposition

R. Crandall, Kim M. Jones, A. Mahan, 1999 .

Determination of the Mobile-Hydrogen Charge State in Hydrogenated Amorphous Silicon

R. Reedy, R. Crandall, H. Branz, 2001 .

A direct correlation between film structure and solar cell efficiency for HWCVD amorphous silicon germanium alloys

Y. Xu, L. Gedvilas, D. L. Williamson, 2009 .

Influence of microstructure on the Urbach edge of amorphous SiC:H and amorphous SiGe:H alloys

R. Tsu, A. Mahan, P. Menna, 1987 .

An update on silicon deposition performed by hot wire CVD

A. Mahan, 2006 .

Solar cell research and development using the hot wire CVD process

A. Mahan, 2003, 3rd World Conference onPhotovoltaic Energy Conversion, 2003. Proceedings of.

Solid-phase crystallization kinetics and grain structure during thermal annealing of a-Si:H grown by chemical vapor deposition

D. Ginley, S. P. Ahrenkiel, A. Mahan, 2011 .

Optimization of crystalline tungsten oxide nanoparticles for improved electrochromic applications

Sehee Lee, R. Deshpande, B. To, 2007 .

Deposition of Device Quality μc-Si Films and Solar Cells at High Rates by HWCVD in a W Filament Regime where W/Si Formation is Minimal

B. Yan, D. L. Williamson, A. Mahan, 2003 .

Devices Fabrication with Narrow-Bandgap a-SiGe:H Alloys Deposited by HWCVD

R. Reedy, H. Branz, B. Yan, 2004 .

Deposition of Optimal a-Si:H and a-SiGe:H by HWCVD Using the Same Filament Temperature and Substrate Temperature

Y. Xu, L. Gedvilas, A. Mahan, 2004 .

Saturated defect densities of hydrogenated amorphous silicon grown by hot-wire chemical vapor deposition at rates up to 150 Å/s

R. Crandall, Y. Xu, A. Gallagher, 2001 .

Anisotropy in Hydrogenated Amorphous Silicon Films as Observed Using Polarized FTIR-ATR Spectroscopy

R. Reedy, R. Crandall, L. Gedvilas, 1999 .

Hot-wire chemical vapor deposition of crystalline tungsten oxide nanoparticles at high density

P. Parilla, A. Dillon, Kim M. Jones, 2005 .

Hot-wire chemical vapor deposition of carbon nanotubes

P. Parilla, A. Dillon, M. Heben, 2003 .

Microstructure and the light‐induced metastability in hydrogenated amorphous silicon

E. Bhattacharya, A. Mahan, 1988 .

Evidence for graphitic‐type bonding in glow discharge hydrogenated amorphous silicon carbon alloys

D. L. Williamson, A. Mahan, B. Roedern, 1985 .

Evidence for microstructure in glow discharge hydrogenated amorphous Si-C alloys

R. Tsu, D. L. Williamson, A. Mahan, 1987 .

Material properties of glow-discharge a-SiSn:H alloys

R. Konenkamp, D. L. Williamson, Arun Madan, 1984 .

Microvoids in amorphous Si1-xCx: H alloys studied by small-angle x-ray scattering

R. Crandall, D. L. Williamson, A. Mahan, 1989 .

Photonic amorphous silicon device technology

R. J. Tonucci, C. Fortmann, A. Mahan, 2006 .

The observation of microvoids in device quality hydrogenated amorphous silicon

R. Crandall, D. L. Williamson, A. Mahan, 1989 .

Small-angle X-ray scattering studies of microvoids in a-SiC:H and a-Si:H

R. Crandall, D. L. Williamson, A. Mahan, 1989 .

Influence of microstructure on the photoconductivity of glow discharge deposited amorphous SiC:H and amorphous SiGe:H alloys

R. Tsu, A. Mahan, P. Raboisson, 1987 .

Influence of annealing above the deposition temperature on metastability in amorphous silicon

A. Poruba, M. Vaněček, R. Crandall, 1996 .

Comparative Study of Hydrogen Diffusion in Hot-Wire and Glow-Discharge-Deposited a-Si:H

R. Crandall, H. Branz, J. Shinar, 1999 .

On equilibration processes in GD amorphous silicon, prepared at high substrate temperatures

M. Vaněček, R. Crandall, A. Mahan, 1991 .

Correction for multiple reflections in infrared spectra of amorphous silicon

A. Mahan, A. Langford, M. Fleet, 1989 .

Optical absorption and disorder in hydrogenated amorphous SiGe and SiC alloy systems

R. Tsu, A. Mahan, P. Menna, 1987 .

On the differences between a-SiC:H films deposited with and without fluorine

D. L. Williamson, A. Mahan, P. Raboisson, 1985 .

The Effect of H 2 Dilution On Thin Film SiN Deposited by Hot Wire Cvd Using SiH 4 and NH 3 Gas Mixtures

A. Dillon, D. L. Williamson, J. Perkins, 2001 .

Microstructure and the Urbach Edge in Glow Discharge Deposited a-SiC:H

R. Crandall, A. Mascarenhas, D. L. Williamson, 1988 .

Properties of amorphous silicon tin alloys produced using the radio frequency glow discharge technique

D. L. Williamson, A. Mahan, A. Madan, 1984 .

Why the photoconductivity decreases in a-SiC:H and a-SiGe:H when the amount of alloying increases

R. Tsu, A. Mascarenhas, A. Mahan, 1988 .

The Effect of Oxygen Contamination on the Electronic Properties of Hot-Wire CVD Amorphous Silicon Germanium Alloys

S. Golledge, H. Branz, A. Mahan, 2006 .

Transport properties of intrinsic hydrogenated amorphous silicon produced by the hot-wire technique investigated by the photomixing technique

R. Crandall, Yi Tang, A. Mahan, 1997 .

Deposition of Device Quality, Low H Content a-Si:H by the Hot Wire Technique

R. Crandall, A. Mahan, B. Nelson, 1991 .

Films and Devices Deposited by Hwcvd at Ultra High Deposition Rates

M. Vaněček, Y. Xu, L. Gedvilas, 2001 .

The structure of a-Si:H by small angle x-ray scattering

G. D. Mooney, D. L. Williamson, A. Mahan, 1991 .

Small angle X-ray scattering from microvoids in the a-SiC:H alloy

R. Crandall, D. L. Williamson, A. Mahan, 1989 .

Critical comparison of light‐induced changes in sub‐band‐gap absorption and photoconductivity in hydrogenated amorphous silicon

J. Pankove, R. Crandall, E. Bhattacharya, 1989 .

Temperature-dependent photoconductivity and light-induced changes in a-Si1−xGex:H alloys

R. Tsu, T. Mcmahon, A. Mahan, 1987 .

An Assessment of a-SiGe:H Alloys with a Band GaP of 1.5Ev as to their Suitability for Solar Cell Applications

T. Mcmahon, A. Mahan, B. Roedern, 1985 .

High-deposition rate a-Si:H n–i–p solar cells grown by HWCVD

R. Crandall, H. Branz, Qi Wang, 2001 .

Efficient high-deposition-rate all-hot-wire hydrogenated amorphous silicon n-i-p solar cells

R. Crandall, H. Branz, Qi Wang, 2000, Conference Record of the Twenty-Eighth IEEE Photovoltaic Specialists Conference - 2000 (Cat. No.00CH37036).

Efficient 18 Å/s Solar Cells with All Silicon Layers Deposited by Hot-Wire Chemical Vapor Deposition

R. Crandall, H. Branz, Qi Wang, 2000 .

Amorphous Solid without Low Energy Excitations

Xiao Liu, R. Crandall, R. Pohl, 1997 .

Status of Cat-CVD (Hot Wire CVD) research in the United States

A. Mahan, 2001 .

Molecular hydrogen in amorphous silicon revisited

R. Crandall, A. Mahan, T. Su, 2000 .

Ortho-molecular hydrogen in hydrogenated amorphous silicon

R. Crandall, A. Mahan, T. Su, 2000 .

Assessment of Intrinsic-Layer Growth Temperature to High-Deposition-Rate a-Si:H n-i-p Solar Cells Deposited by Hot-Wire CVD

Qi Wang, A. Mahan, B. Nelson, 1999 .

NMR Studies of Molecular Hydrogen in Hydrogenated Amorphous Silicon

R. Crandall, A. Mahan, T. Su, 1999 .

H-Out-Diffusion and Device Performance In n-i-p Solar Cells Utilizing High Temperature Hot Wire a si: H i-Layers

R. Reedy, S. Guha, R. Crandall, 1998 .

Low Defect Density Microcrystalline-Si Deposited by the Hot Wire Technique

A. Poruba, M. Vaněček, R. Crandall, 1998 .

Hydrogenated Amorphous Silicon Grown by Hot-Wire CVD at Deposition Rates up to 1 µm/minute

D. L. Williamson, A. Mahan, B. Nelson, 2000 .

Hydrogenated Amorphous Silicon Germanium Alloys Grown by the Hot-Wire Chemical Vapor Deposition Technique

R. Reedy, A. Gallagher, D. L. Williamson, 1998 .

On the role of hydrogen in metastable defect equilibration in undoped hydrogenated amorphous silicon

M. Vaněček, R. Crandall, A. Mahan, 1993 .

Reversible Lithium‐Ion Insertion in Molybdenum Oxide Nanoparticles

Anne C. Dillon, Dane T. Gillaspie, Yong-Hyun Kim, 2008 .

Rapid solid-phase crystallization of high-rate, hot-wire chemical-vapor-deposited hydrogenated amorphous silicon

L. Gedvilas, H. Branz, D. Young, 2006 .

Silicon network relaxation in amorphous hydrogenated silicon

M. Vaněček, Z. Remeš, R. Crandall, 1997 .

Rapid thermal annealing of hot wire chemical-vapor-deposited a-Si:H films: The effect of the film hydrogen content on the crystallization kinetics, surface morphology, and grain growth

D. W. Readey, R. Reedy, D. Ginley, 2006 .

Physics of Solid-Phase Epitaxy of Hydrogenated Amorphous Silicon for Thin Film Si Photovoltaics

R. Reedy, Yanfa Yan, G. Teeter, 2006 .

Electron impact excitation of the 3S, 3P, and 3D states of H

A. Gallagher, A. Mahan, Stephen J. Smith, 1976 .

Observation of coherent excitation processes in e-H collisions

A. Mahan, Stephen J. Smith, 1977 .

Fluorine-Induced Microvoids in Amorphous Silicon

A. Mahan, A. Langford, M. Fleet, 1989 .

Deposition of device quality, low H content amorphous silicon

Isaac Balberg, Brent P. Nelson, Richard S. Crandall, 1991 .

Continuous Hot Wire Chemical Vapor Deposition of High-Density Carbon Multiwall Nanotubes

P. Parilla, A. Dillon, M. Heben, 2003 .

Metal oxide nanoparticles for advanced energy applications

Sehee Lee, R. Deshpande, P. Parilla, 2009 .

Metal oxide nano-particles for improved electrochromic and lithium-ion battery technologies

A. C. Dillon, A. H. Mahan, Rohit Deshpande, 2008 .

Hot-wire chemical vapor synthesis for a variety of nano-materials with novel applications

Sehee Lee, R. Deshpande, A. Dillon, 2006 .

Crystalline WO3 Nanoparticles for Highly Improved Electrochromic Applications

Bobby To, Kim M. Jones, A. C. Dillon, 2006 .

Discovering the Mechanism of H 2 Adsorption on Aromatic Carbon Nanostructures to Develop Adsorbents for Vehicular Applications

Shengbai Zhang, P. Parilla, A. Dillon, 2004 .

Enhancing Hydrogen Adsorption by Metal Incorporation in Carbon Multi-Wall Nanotubes Produced by Continuous Hot Wire Chemical Vapor Deposition

P. Parilla, A. Dillon, M. Heben, 2003 .

Structural properties of hot wire a-Si:H films deposited at rates in excess of 100 /s

L. Gedvilas, A. Mahan, B. Nelson, 2001 .

HWCVD MoO3 nanoparticles and a-Si for next generation Li-ion anodes

Steven M. George, Chunmei Ban, A. C. Dillon, 2011 .

Electron impact excitation of the 3 S , 3 P , and 3 D states of H

A. Gallagher, A. Mahan, Stephen J. Smith, 1976 .

Deposition of Photosensitive Hydrogenated Amorphous Silicon-Germanium Films with a Tantalum Hot Wire

R. Reedy, L. Gedvilas, H. Branz, 2006 .

Electron field emission from ferromagnetic europium sulfide on tungsten

A. Mahan, G. Baum, B. Reihl, 1978 .

Field emission of monoenergetic spin-polarized electrons

A. Mahan, G. Baum, B. Reihl, 1977 .

Effects of adsorbates on electron spin polarization in low energy electron diffraction from tungsten (001): III. Nitrogen overlayer

G. K. Walters, F. Dunning, A. Mahan, 1975 .

Conduction-band tunneling and electron-spin polarization in field emission from magnetically ordered europium sulfide on tungsten

A. Mahan, G. Baum, E. Kisker, 1976 .

Hot wire chemical vapor deposition of Si containing materials for solar cells

A. H. Mahan, A. Mahan, 2003 .

Amorphous silicon films and solar cells deposited by HWCVD at ultra-high deposition rates

Brent P. Nelson, A. H. Mahan, Y. Xu, 2002 .

Thermally induced metastable defect studies on hydrogenated amorphous silicon films with different hydrogen contents

M. Vaněček, A. Mahan, 1995 .

Laser nucleation and solid phase crystallization of a-Si:H

M. S. Dabney, A. H. Mahan, M. F. van Hest, 2012, Other Conferences.

Low-cost digital system for control of a retarding potential energy analyzer.

F. Dunning, A. Mahan, L. Hodge, 1979, The Review of scientific instruments.

MECHANISMS INFLUENCING HOT-WIRE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON

E. Molenbroek, A. Gallagher, A. Mahan, 1997 .

The Influence of W Filament Alloying on the Electronic Properties of Hwcvd Deposited a-Si:H Films

A. Gallagher, A. Mahan, B. Nelson, 2000 .

BF3-doped amorphous silicon thin films

A. Mahan, G. Devaud, Ralph C. Kernsa, 1983 .

Si–H bonding in low hydrogen content amorphous silicon films as probed by infrared spectroscopy and x-ray diffraction

J. D. Webb, A. H. Mahan, Lynn M. Gedvilas, 2000 .

Monitoring of crystallization and the effect of the deposition rate, hydrogen content and annealing process on the crystallization of hot wire chemical vapor deposited hydrogenated amorphous silicon (a-Si:H) films

Qi Wang, Robert C. Reedy, D. S. Ginley, 2008 .

Physical properties of HWCVD microcrystalline silicon thin films

Y. Xu, M. Al‐Jassim, K. Jones, 2002, Conference Record of the Twenty-Ninth IEEE Photovoltaic Specialists Conference, 2002..

Microvoids and Photoconductivities in a-SiC:H and a-Si:H

A. Mahan, B. Nelson, D. Williamson, 1989 .

Recent advances in hot-wire CVD R&D at NREL : From 18% silicon heterojunction cells to silicon epitaxy at glass-compatible temperatures

H. Branz, D. Young, C. Teplin, 2008 .

Hot wire chemical vapor deposition of isolated carbon single-walled nanotubes

P. Parilla, A. Dillon, M. Heben, 2002 .

Defects in hot-wire deposited amorphous silicon: results from electron spin resonance

R. Reedy, T. Unold, A. Mahan, 1998 .

The Influence of Electrons From the Filament on the Material Properties of Hydrogenated Amorphous Silicon Grown by the Hot-Wire Chemical Vapor Deposition Technique

R. Crandall, Qi Wang, A. Mahan, 1998 .

Grain Nucleation and Grain Growth During Crystallization of HWCVD a-Si:H Films

D. Ginley, S. P. Ahrenkiel, A. Mahan, 2006 .

Rapid Thermal Annealing of HWCVD a-Si:H Films: The Effect of the Film Hydrogen Content on the Crystallization Kinetics, Surface Morphology, and Grain Growth

R. Reedy, D. Ginley, A. Mahan, 2005 .

Properties of thin film silicon nitride deposited by hot wire chemical vapor deposition using silane, ammonia, and hydrogen gas mixtures

A. Dillon, L. Gedvilas, J. Perkins, 2003 .

Identification of Possible Bonding Sites for Post Deposition Oxygen Absorption in Microcrystalline Silicon

L. Gedvilas, A. Mahan, 2004 .

A reduction in the Staebler‐Wronski effect observed in low H content a‐Si:H films deposited by the hot wire technique

M. Vaněček, A. Mahan, 1991 .

Electronic Properties of Improved Amorphous Silicon-Germanium Alloys Deposited by a Low Temperature Hot Wire Chemical Vapor Deposition Process

A. Mahan, J. D. Cohen, Yueqing Xu, 2005 .

Junction capacitance study of an oxygen impurity defect exhibiting configuration relaxation in amorphous silicon–germanium alloys deposited by hot-wire CVD

H. Branz, A. Mahan, J. D. Cohen, 2008 .

Altering the nucleation of thermally annealed hydrogenated amorphous silicon with laser processing

P. Parilla, D. Ginley, L. Gedvilas, 2009 .

Relative crystallite sizes for thermally annealed HWCVD A-Si:H films with and without a sub-threshold laser fluence

B. To, P. Parilla, D. Ginley, 2010, 2010 35th IEEE Photovoltaic Specialists Conference.

An Examination of H Effusion in a-Si:H Using Infrared Spectroscopy

A. Mahan, E. J. Johnson, J. Webb, 1993 .

Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe:H

R. Reedy, H. Branz, A. Mahan, 2008 .

An alternative method to determine the steady state nucleation rate in thermally annealed HWCVD a-Si:H films

B. To, P. Parilla, D. Ginley, 2011 .

New Results on the Microstructure of Amorphous Silicon as Observed by Internal Friction

Xiao Liu, R. Crandall, R. Pohl, 1997 .

Measurement of Two Deep H Bonding Levels in Device Quality Glow Discharge a-SI:H

R. Crandall, H. Branz, A. Mahan, 1995 .