T. Nishimoto

Amorphous silicon solar cells deposited at high growth rate

Madoka Takai, Michio Kondo, M. Takai, 2002 .

Guiding principles for obtaining stabilized amorphous silicon at larger growth rates

M. Takai, A. Matsuda, M. Kondo, 2000 .

Effect of higher-silane formation on electron temperature in a silane glow-discharge plasma

M. Takai, A. Matsuda, M. Kondo, 2000 .

Effect of halogen additives on the stability of a-Si:H films deposited at a high-growth rate

A. Matsuda, M. Kondo, T. Takagi, 2001 .

Electrode distance dependence of photo-induced degradation in hydrogenated amorphous silicon

M. Takai, A. Matsuda, M. Kondo, 2002 .

Relationship between the photo-induced degradation characteristics and film structure of a-Si:H films prepared under various conditions

M. Takai, A. Matsuda, T. Nishimoto, 2000, Conference Record of the Twenty-Eighth IEEE Photovoltaic Specialists Conference - 2000 (Cat. No.00CH37036).

Effect of substrate temperature on plasma parameter in high rate growth of stable amorphous silicon

A. Matsuda, M. Takai, M. Kondo, 2000, Conference Record of the Twenty-Eighth IEEE Photovoltaic Specialists Conference - 2000 (Cat. No.00CH37036).

Control of plasma chemistry for preparing highly stabilized amorphous silicon at high growth rate

Madoka Takai, Michio Kondo, M. Takai, 2003 .

Chemical-reaction dependence of plasma parameter in reactive silane plasma

Madoka Takai, Michio Kondo, M. Takai, 2001 .

High-rate growth of stable a-Si:H

Michio Kondo, Ryo Hayashi, A. Payne, 1999 .

Gas Phase Diagnosis of Disilane/Hydrogen RF Glow Discharge Plasma and Its Application to High Rate Growth of High Quality Amorphous Silicon

A. Matsuda, M. Kondo, T. Takagi, 1999 .