T. Kawakami

Real three-dimensional microstructures fabricated by photopolymerization of resins through two-photon absorption.

J. Ye, H. Misawa, M. Miwa, 2000, Optics letters.

Femtosecond two-photon stereo-lithography

Saulius Juodkazis, Hiroaki Misawa, Masafumi Miwa, 2001 .

Novel EUV Resist Materials and Process for 20 nm Half Pitch and Beyond

Ken Maruyama, Yoshi Hishiro, Koji Inukai, 2013 .

New Polymer Design by DLS Analysis of Development Defect Detection

Yoshikazu Yamaguchi, Kenji Hoshiko, Yutaka Makita, 2008 .

Multiple regression analysis of postdevelop unbiased line width roughness and etch resistance for high-accuracy estimations of postetch pattern roughness

T. Kawakami, Mihyun Lee, Masayuki Miyake, 2022, Journal of Micro/Nanopatterning, Materials, and Metrology.

Design and synthesis of a photoaromatization-based two-stage photobase generator for pitch division lithography.

Ryan A. Mesch, S. Jockusch, N. Turro, 2013, The Journal of organic chemistry.

Photobase generator enabled pitch division: a progress report

C. Grant Willson, Taeho Kim, Roel Gronheid, 2011, Advanced Lithography.