D. Vangoidsenhoven

Fabrication and room temperature characterization of trilayer junctions for the development of superconducting qubits on 300 mm wafers

D. Tsvetanova, T. Ivanov, B. Govoreanu, 2021 .

Investigation of Forming and Its Controllability in Novel HfO 2 -Based 1T1R 40nm-Crossbar RRAM Cells

K. Devriendt, O. Richard, H. Bender, 2011 .

Exploration of EUV-based self-aligned multipatterning options targeting pitches below 20nm

C. Lorant, S. Decoster, F. Lazzarino, 2019, Advanced Lithography.

Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

Mireille Maenhoudt, Andy Miller, Patrick Wong, 2009, Lithography Asia.

High-coherence superconducting qubits made using industry-standard, advanced semiconductor manufacturing

Y. Canvel, D. Vangoidsenhoven, M. Mongillo, 2024, 2403.01312.