Laren M. Tolbert

发表

The use of surface modifiers to mitigate pattern collapse in thin film lithography

Clifford L. Henderson, Wei-Ming Yeh, David E. Noga, 2010, Advanced Lithography.

Single molecule chemically amplified resists based on ionic and non-ionic PAGs

Clifford L. Henderson, Cheng-Tsung Lee, Wang Yueh, 2008, SPIE Advanced Lithography.

Positive tone cross-linked resists based on photoacid inhibition of cross linking

Clifford L. Henderson, Mark Neisser, Richard A. Lawson, 2014, Advanced Lithography.

Resist surface crosslinking using amine-based reactive rinses to mitagate pattern collapse in thin film lithography

Clifford L. Henderson, Wei-Ming Yeh, Richard A. Lawson, 2012, Other Conferences.

Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films

Clifford L. Henderson, Wei-Ming Yeh, David E. Noga, 2010, Advanced Lithography.

Non-ionic PAG behavior under high energy exposure sources

Clifford L. Henderson, David E. Noga, Richard A. Lawson, 2009, Advanced Lithography.

Mesoscale simulation of molecular glass photoresists: effect of PAG loading and acid diffusion coefficient

Clifford L. Henderson, Cheng-Tsung Lee, Wang Yueh, 2008, SPIE Advanced Lithography.

Understanding pattern collapse in high-resolution lithography: impact of feature width on critical stress

Clifford L. Henderson, Cheng-Tsung Lee, David E. Noga, 2009, Advanced Lithography.

A study of reactive adhesion promoters and their ability to mitigate pattern collapse in thin film lithography

Clifford L. Henderson, Wei-Ming Yeh, Richard A. Lawson, 2011, Advanced Lithography.

Effect of molecular resist structure on glass transition temperature and lithographic performance in epoxide functionalized negative tone resists

Clifford L. Henderson, Mark Neisser, Richard A. Lawson, 2015, Advanced Lithography.

Bio-oxidation of arylalkyl hydrocarbons

Laren M. Tolbert, 1988 .

Non-traditional resist designs using molecular resists: positive tone cross-linked and non-chemically amplified molecular resists

Jing Cheng, Clifford L. Henderson, David E. Noga, 2010, Advanced Lithography.

Single component molecular resists containing bound photoacid generator functionality

Clifford L. Henderson, Richard A. Lawson, Laren M. Tolbert, 2009, Advanced Lithography.

Methods of controlling cross-linking in negative-tone resists

Clifford L. Henderson, Mark Neisser, Richard A. Lawson, 2014, Advanced Lithography.

Water-developable negative-tone single-molecule resists: high-sensitivity nonchemically amplified resists

Clifford L. Henderson, Cheng-Tsung Lee, Wang Yueh, 2008, SPIE Advanced Lithography.

Investigation of high χ block copolymers for directed self-asssembly: synthesis and characterization of PS-b-PHOST

Jing Cheng, Clifford L. Henderson, Wei-Ming Yeh, 2012, Advanced Lithography.

Negative-tone molecular resists based on cationic polymerization

Clifford L. Henderson, Richard A. Lawson, Laren M. Tolbert, 2009, Advanced Lithography.

Postiive tone resists based on network deploymerization of molecular resists

Jing Cheng, Clifford L. Henderson, Richard A. Lawson, 2013, Advanced Lithography.

Developing directly photodefinable substrate guiding layers for block copolymer directed self-assembly (DSA) patterning

Jing Cheng, Clifford L. Henderson, Wei-Ming Yeh, 2011, Advanced Lithography.

Methods to explore and prevent pattern collapse in thin film lithography

Clifford L. Henderson, Wei-Ming Yeh, David E. Noga, 2010, Advanced Lithography.

The effect of drying rate on pattern collapse performance in thin film lithography

Clifford L. Henderson, Wei-Ming Yeh, Richard A. Lawson, 2011, Advanced Lithography.

Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning

Jing Cheng, Clifford L. Henderson, Wei-Ming Yeh, 2012, Advanced Lithography.

Novel surface imaging method using surface monolayer initiated polymerization

Clifford L. Henderson, Laren M. Tolbert, Dennis W. Hess, 2002, SPIE Advanced Lithography.

Optimizing performance in cross-linking negative-tone molecular resists

Clifford L. Henderson, Mark Neisser, Richard A. Lawson, 2015, Advanced Lithography.

Base developable negative tone molecular resist based on epoxide cross-linking

Clifford L. Henderson, Mark Neisser, Richard A. Lawson, 2015, Advanced Lithography.

Molecular glass photoresists containing photoacid generator functionality: a route to a single-molecule photoresist

Clifford L. Henderson, Jeanette M. Roberts, Cheng-Tsung Lee, 2007, SPIE Advanced Lithography.

Application of aziridine reactive rinses in a post-development process to reduce photoresist pattern collapse

Clifford L. Henderson, Wei-Ming Yeh, Richard A. Lawson, 2012, Other Conferences.

Aqueous and solvent developed negative-tone molecular resists

Clifford L. Henderson, David E. Noga, Richard A. Lawson, 2010, Advanced Lithography.

Single-component molecular resists containing bound photoacid generator functionality

Clifford L. Henderson, Richard A. Lawson, Laren M. Tolbert, 2010 .

Influence of solubility switching mechanism on resist performance in molecular glass resists

Clifford L. Henderson, Cheng-Tsung Lee, Wang Yueh, 2007 .

Characterization of nanocrystalline and thin film TiO2 solar cells with poly(3-undecyl-2,2'-bithiophene) as a sensitizer and hole conductor

Greg P. Smestad, Adam M. Schwartzberg, Laren M. Tolbert, 2002 .

High resolution negative tone molecular resist based on di-functional epoxide polymerization

Clifford L. Henderson, Cheng-Tsung Lee, Richard A. Lawson, 2009 .

Nonionic photoacid generator behavior under high-energy exposure sources

Clifford L. Henderson, David E. Noga, Richard A. Lawson, 2009 .

Optical Spectroscopy of Grafted Poly(p-phenyleneethynylene)s in Water and Water−DMF Mixtures

Laren M. Tolbert, Kyril M. Solntsev, James N. Wilson, 2008 .

A technique to compare polythiophene solid-state dye sensitized TiO2 solar cells to liquid junction devices

Greg P. Smestad, Adam M. Schwartzberg, Laren M. Tolbert, 2003 .

Beyond the Cyanine Limit: Peierls Distortion and Symmetry Collapse in a Polymethine Dye

Laren M. Tolbert, Xiaodong Zhao, L. Tolbert, 1997 .

Chromophore Photoreduction in Red Fluorescent Proteins Is Responsible for Bleaching and Phototoxicity

Anna I. Krylov, Andreas S. Bommarius, Dmitry A. Bloch, 2014, The journal of physical chemistry. B.

Comparison of positive tone versus negative tone resist pattern collapse behaviora)

Clifford L. Henderson, Wei-Ming Yeh, David E. Noga, 2010 .

Epoxide functionalized molecular resists for high resolution electron-beam lithography

Clifford L. Henderson, Cheng-Tsung Lee, Wang Yueh, 2008 .

Sugar-Substituted Poly(p-phenyleneethynylene)s: Sensitivity Enhancement toward Lectins and Bacteria

Laren M. Tolbert, U. Bunz, Ronnie L. Phillips, 2008 .

Polymer pattern formation on SiO2 surfaces using surface monolayer initiated polymerization

Clifford L. Henderson, Jürgen Rühe, Laren M. Tolbert, 2001 .

Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups

Clifford L. Henderson, David E. Noga, Richard A. Lawson, 2009 .