D. Hausmann

发表

Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films

Roy G. Gordon, R. Gordon, D. Hausmann, 2003 .

Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors

Esther Kim, Roy G. Gordon, R. Gordon, 2002 .

Thermal Atomic Layer Etching of Silica and Alumina Thin Films Using Trimethylaluminum with Hydrogen Fluoride or Fluoroform.

Y. Chabal, E. Mattson, D. Smith, 2018, ACS applied materials & interfaces.

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

Adriana Szeghalmi, Jon Henri, Akhil Sharma, 2018, ACS applied materials & interfaces.

Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?

D. Mocuta, K. Kinoshita, T. Ishijima, 2018 .

A Three-Step Atomic Layer Deposition Process for SiN x Using Si2Cl6, CH3NH2, and N2 Plasma.

S. Agarwal, D. Hausmann, Rafaiel A Ovanesyan, 2018, ACS applied materials & interfaces.

Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics

S. Agarwal, D. Hausmann, Rafaiel A Ovanesyan, 2017 .

Atomic Layer Deposition of SiCxNy Using Si2Cl6 and CH3NH2 Plasma

N. Leick, S. Agarwal, Kathryn M. Kelchner, 2017 .

Surface reactions of aminosilane precursors during N 2 plasma‐assisted atomic layer deposition of SiN x

N. Leick, S. Agarwal, D. Hausmann, 2019, Plasma Processes and Polymers.

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies.

W. Kessels, H. Knoops, T. Faraz, 2017, ACS applied materials & interfaces.

Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si₂Cl₆ and NH₃ Plasma.

S. Agarwal, D. Hausmann, Rafaiel A Ovanesyan, 2015, ACS applied materials & interfaces.

Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru

S. Bent, D. Hausmann, Nerissa Draeger, 2019, Chemistry of Materials.

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

Robin H. A. Ras, A. A. Malygin, C. Hwang, 2017 .

Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area Selective Atomic Layer Deposition.

S. Bent, D. Hausmann, Nerissa Draeger, 2020, ACS applied materials & interfaces.

Vapor Deposition of Metal Oxides and Silicates: Possible Gate Insulators for Future Microelectronics

R. Gordon, D. Hausmann, J. Becker, 2001 .

Vapor Deposition of Metal Oxides and Silicates: Possible Gate Insulators for Future Microelectronics.

R. Gordon, D. Hausmann, J. Becker, 2001 .

Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates

Roy G. Gordon, R. Gordon, Sheng-Chang Wang, 2002, Science.

Nanostructuring of Nb-Si-Cr Alloys by Electron Beam Melting to Improve the Mechanical Properties and the Oxidation Behavior

S. Neumeier, P. Felfer, D. Hausmann, 2021, Metallurgical and Materials Transactions A.

Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO2

W. Kessels, D. Hausmann, A. Mackus, 2020 .

Formation and Ripening of Self-Assembled Multilayers from the Vapor-Phase Deposition of Dodecanethiol on Copper Oxide

S. Bent, David S. Bergsman, D. Hausmann, 2018, Chemistry of Materials.

Gas Phase Organic Functionalization of SiO2 with Propanoyl Chloride.

S. Agarwal, E. Hudson, D. Hausmann, 2018, Langmuir : the ACS journal of surfaces and colloids.

Effect of reaction mechanism on precursor exposure time in atomic layer deposition of silicon oxide and silicon nitride.

C. Murray, S. D. Elliott, D. Hausmann, 2014, ACS applied materials & interfaces.

A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches

Esther Kim, Roy G. Gordon, Joseph F. Shepard, 2003 .

Investigating routes toward atomic layer deposition of silicon carbide: Ab initio screening of potential silicon and carbon precursors

S. D. Elliott, E. Filatova, D. Hausmann, 2017 .

Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook

S. Agarwal, S. D. Elliott, E. Filatova, 2019 .

Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors

Roy G. Gordon, R. Gordon, D. Hausmann, 2003 .

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

Jun Yu Li, W. Kessels, P. Lemaire, 2022, The journal of physical chemistry. C, Nanomaterials and interfaces.

Selective deposition of AlOx for Fully Aligned Via in nano Cu interconnects

B. Haran, J. Demarest, J. Li, 2021, International Interconnect Technology Conference.

Understanding the Mechanism of SiC Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Developing Routes toward SiC Atomic Layer Deposition (ALD) with Density Functional Theory.

S. D. Elliott, E. Filatova, D. Hausmann, 2018, ACS applied materials & interfaces.

Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition.

S. Bent, L. Zeng, D. Hausmann, 2021, Langmuir : the ACS journal of surfaces and colloids.

Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources

S. Agarwal, P. Lemaire, Wanxing Xu, 2020 .

Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO2

S. Agarwal, P. Lemaire, Wanxing Xu, 2021 .

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies.

W. Kessels, H. Knoops, T. Faraz, 2017, ACS Applied Materials and Interfaces.

A Three-Step Atomic Layer Deposition Process for SiN x Using Si2Cl6, CH3NH2, and N2 Plasma.

S. Agarwal, D. Hausmann, Rafaiel A Ovanesyan, 2018, ACS applied materials & interfaces.