Jake Kaminsky

Polymer effects on PAG acid yield in EUV resists

Robert L. Brainard, Steven Grzeskowiak, Jake Kaminsky, 2018, Advanced Lithography.

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Joe Lee, Akiteru Ko, Cody Murray, 2020, Advanced Lithography.

Investigating the threshold electron energy for reactions in EUV resist materials

Ulrich Welling, Lawrence S. Melvin, Robert L. Brainard, 2018, Advanced Lithography.

Electron trapping: a mechanism for acid production in extreme ultraviolet photoresists

Robert L. Brainard, Steven Grzeskowiak, Jake Kaminsky, 2018 .

Analytical techniques for mechanistic characterization of EUV photoresists

Amrit Narasimhan, Robert L. Brainard, Steven Grzeskowiak, 2017, Advanced Lithography.