Emmanuel Scheid

Residual stress in low pressure chemical vapor deposition SiNx films deposited from silane and ammonia

Pierre Temple-Boyer, E. Saint-Etienne, P. Temple-Boyer, 1998 .

Optical and structural properties of SiOx and SiNx materials

Pierre Temple-Boyer, Redhouane Henda, J. J. Pedroviejo, 1995 .

Characterization of ZrO2 thin films deposited by MOCVD for high-density 3D capacitors

Magali Brunet, M. Brunet, M. Herbst, 2009 .

Theoretical and experimental study of silicon micromachined microheater with dielectric stacked membranes

Carole Rossi, Daniel Estève, D. Estève, 1997 .

Power MOSFET RDSon under repetitive avalanche cycling

Jean-Marie Dorkel, Jean-Michel Reynes, Emmanuel Scheid, 2009, 2009 IEEE International Symposium on Industrial Electronics.

Boron doped polysilicon deposition in a sector reactor : Specific phenomena and properties

E. Scheid, Emmanuel Scheid, H. Vergnes, 1999 .

Design of a low power SnO2 gas sensor integrated on silicon oxynitride membrane

Anne-Marie Gué, J. P. Guillemet, A. Gué, 2000 .

Nonlinear capacitors integration

Pascal Dubreuil, J. Laur, P. Dubreuil, 2000, 2000 International Semiconductor Conference. 23rd Edition. CAS 2000 Proceedings (Cat. No.00TH8486).

Effect of Annealing Conditions on Photoluminescence Properties of Low-Pressure Chemical Vapour Deposition-Grown Silicon Nanocrystals

Olivier Gauthier-Lafaye, Gérard Sarrabayrouse, F. Lozes-Dupuy, 2008 .

Deposition of Thick Layers, in a New CVD Reactor

Hugues Vergnes, P. Duverneuil, Jean-Pierre Couderc, 1995 .

1D Simulation of Oxidation-Enhanced and Oxidation-Retarded Diffusion in Silicon and Validity of the Physical Model. Transition to the 2D Case

Pascale Chenevier, P. Chenevier, E. Scheid, 1986 .