R. H. Kim

A 0.063 µm2 FinFET SRAM cell demonstration with conventional lithography using a novel integration scheme with aggressively scaled fin and gate pitch

K. Maitra, P. Kulkarni, T. Yamashita, 2010, 2010 Symposium on VLSI Technology.

Investigation of Plasma Enhanced Chemical Vapor Deposition Chamber Mismatching by Photoluminescence and Raman Spectroscopy

W. Yoo, T. Ishigaki, K. Kang, 2015 .