P. Simon

Antenna ratio definition for VLSI circuits [plasma etch damage]

W. Maly, J. Luchies, Wojciech Maly, 1999, 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395).

Relation between product yield and plasma process induced damage

W. Maly, F. Kuper, J. Luchies, 1998, 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100).