C. W. Wilkins

发表

Microstructure, impurity content and critical current density in Nb3Sn

P. B. Hart, C. Hill, R Ogden, 1969 .

Polymer Materials for Electronic Applications

C. W. Wilkins, E. Feit, 1982 .

A novel approach to o‐nitrobenzyl photochemistry for resists

Elsa Reichmanis, Edwin Arthur Chandross, E. Reichmanis, 1981 .

The Effect of Substituents on the Photosensitivity of 2‐Nitrobenzyl Ester Deep U.V. Resists

Elsa Reichmanis, Edwin Arthur Chandross, C. W. Wilkins, 1983 .

Response Surface for CMOS Self-Aligned Titanium Silicide Process

S. Meester, C. W. Wilkins, A. Nanda, 1994 .

Synthesis and characterization of the tert-butyl ester of the oxydianiline/pyromellitic dianhydride polyamic acid

F. Houlihan, C. Pryde, C. W. Wilkins, 1989 .

Contaminations and Impurities in DC Magnetron Sputtered WSix Films on SiO2

B. Rambabu, R. B. Irwin, C. W. Wilkins, 1995 .

Lithographic Evaluation of an o‐Nitrobenzyl Ester Based Deep U.V. Resist System

E. Reichmanis, E. Chandross, C. W. Wilkins, 1982 .

Thermal analysis of graphite and carbon-phenolic composites by pyrolysis-mass spectrometry

A. Lyons, C. W. Wilkins, R. Lum, 1983 .

The preparation of low defect density LPE garnet films for magnetic bubble device fabrication

C. W. Wilkins, G. Gill, 1979 .

Fluorinated polyimide nanocomposites for CO2/CH4 separation

C. W. Wilkins, P. Cassidy, Yasuharu Yamada, 2008 .

Polymer materials for electronic applications : based on a symposium sponsored by the Division of Organic Coatings and Plastics Chemistry at the second chemical congress of the North American continent (180th ACS national meeting), Las Vegas, Nevada, August 26-27, 1980

C. W. Wilkins, E. Feit, 1982 .

Thin pinhole-free carbon films

A. Lyons, C. W. Wilkins, M. Robbins, 1983 .

Preliminary Evaluation of Copolymers of Methyl Methacrylate and Acyloximino Methacrylate as Deep U.V. Resists

E. Reichmanis, E. Chandross, C. W. Wilkins, 1980 .

The chemical vapour deposition of epitaxial garnet films for magnetic bubble applications

C. W. Wilkins, 1973 .

The Effect of Sensitizers on the Photodegradation of Poly (Methyl Methacrylate‐co‐3‐Oximino‐2‐Butanone Methacrylate

E. Reichmanis, E. Chandross, C. W. Wilkins, 1980 .

Contrast in the electron-beam lithography of substituted aromatic homopolymers and copolymers

L. F. Thompson, L. Stillwagon, C. W. Wilkins, 1979 .

Preparation of Substituted N-Methacryloxy Phthalimides for E-Beam Lithography

C. W. Wilkins, P. Cassidy, Maheedhar Guntupalli, 2008 .

Deep UV photolithographic systems and processes

E. Reichmanis, E. Chandross, C. W. Wilkins, 1983 .

Materials for multilevel resist schemes

E. Ong, E. Reichmanis, C. W. Wilkins, 1983 .

An organosilicon novalac resin for multilevel resist applications

E. Reichmanis, C. W. Wilkins, T. Wolf, 1985 .

GaAs Process Compatible Adhesion Promoter for PMMA Resists

C. W. Wilkins, M. Levinson, 1986 .