Burn-Jeng Lin

Immersion lithography and its impact on semiconductor manufacturing

B. Lin, Burn-Jeng Lin, 2004 .

Mask error tensor and causality of mask error enhancement for low- k 1 imaging: theory and experiments

Anthony Yen, Tsai-Sheng Gau, Jaw-Jung Shin, 2004 .

Image characterization of bubbles in water for 193-nm immersion lithography—far-field approach

Tsai-Sheng Gau, Chun-Kuang Chen, Burn-Jeng Lin, 2004 .