B. Minghetti

Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes

S. Manakli, L. Pain, J. C. Le denmat, 2007, European Mask and Lithography Conference.

Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)

M. Broekaart, F. Boeuf, S. Manakli, 2005, SPIE Advanced Lithography.

Electron beam direct write process development for sub 45nm CMOS manufacturing

S. Manakli, M. Jurdit, Laurent Pain, 2005, SPIE Advanced Lithography.

A Cost-Effective Low Power Platform for the 45-nm Technology Node

R. Ranica, O. Callen, M. Haond, 2006, 2006 International Electron Devices Meeting.

New electron beam proximity effects correction (EBPC) approach for 45nm and 32nm nodes

S. Manakli, J. Todeschini, M. Jurdit, 2005, Digest of Papers Microprocesses and Nanotechnology 2005.