Erica L. Rausch

Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-D,L-lactide) with Sub-10 nm Domains

C. Grant Willson, Christopher J. Ellison, C. M. Bates, 2012 .

Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.

Christopher J. Ellison, C. M. Bates, C Grant Willson, 2012, ACS nano.