Myoung-Jun Jang

Real time on-chip characterization of time delay arising from multi-level-metallization: decoupling of pure charging and drift-and-charging

Jeong-Mo Hwang, Dae-Mann Kim, Young-Jong Lee, 1998 .

Characterization of crosstalk-induced noise for 0.18 /spl mu/m CMOS technology with 6-level metallization using time domain reflectometry and S-parameters

Oh-Kyong Kwon, Jeong-Mo Hwang, Dae-Mann Kim, 1999 .

On-chip characterization of interconnect parameters and time delay in 0.18 /spl mu/m CMOS technology for ULSI circuit applications

Dae-Mann Kim, Hi-Deok Lee, Myoung-Jun Jang, 2000 .