Hakaru Mizoguchi

发表

Performance of new high-power HVM LPP-EUV source

Tsuyoshi Yamada, Tamotsu Abe, Hiroshi Tanaka, 2016, SPIE Advanced Lithography.

Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source

Akira Sumitani, Takashi Suganuma, Junichi Fujimoto, 2011, Advanced Lithography.

Challenge of the F2 laser for dioptric projection system

Tatsuya Ariga, Kiyoharu Nakao, Hakaru Mizoguchi, 2001, SPIE Advanced Lithography.

Laser-induced damage and defect analysis of calcium fluoride window caused by the high pulse repetition rate of ArF excimer laser radiation

Takahito Kumazaki, Junichi Fujimoto, Hakaru Mizoguchi, 2018, Laser Damage.

193nm high power lasers for the wide bandgap material processing

Junichi Fujimoto, Hiroaki Oizumi, Takashi Matsunaga, 2017, LASE.

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Shinji Nagai, Yoshifumi Ueno, Georg Soumagne, 2019, Photomask Technology.

High power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Tsuyoshi Yamada, Tamotsu Abe, Hiroshi Tanaka, 2018, 2018 China Semiconductor Technology International Conference (CSTIC).

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Satoshi Tanaka, Takahito Kumazaki, Junichi Fujimoto, 2009, Advanced Lithography.

Key components technology update of the 250W high-power LPP-EUV light source

Tamotsu Abe, Hiroshi Tanaka, Hiroaki Nakarai, 2017, Advanced Lithography.

Development of liquid-jet laser-produced plasma light source for EUV lithography

Koichi Toyoda, Hideo Hoshino, Hiroshi Komori, 2003, SPIE Advanced Lithography.

First generation laser-produced plasma source system for HVM EUV lithography

Hiroshi Komori, Akira Sumitani, Tamotsu Abe, 2010, Advanced Lithography.

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Shinji Nagai, Satoshi Tanaka, Toru Suzuki, 2007, SPIE Advanced Lithography.

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Tsuyoshi Yamada, Hiroshi Tanaka, Hiroaki Nakarai, 2018, Advanced Lithography.

The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2016, Advanced Lithography.

Ultra-line-narrowed F2 laser for microlithography

Tatsuya Ariga, Kiyoharu Nakao, Hakaru Mizoguchi, 2002, International Symposium on Laser Precision Microfabrication.

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Satoshi Tanaka, Junichi Fujimoto, Hiroaki Nakarai, 2007, SPIE Advanced Lithography.

High power injection lock 6 kHz 60 W laser for ArF dry/wet lithography

T. Suzuki, H. Umeda, Hakaru Mizoguchi, 2006, SPIE Advanced Lithography.

Performance of a highly stable 2-kHz operation KrF laser

Tatsuya Ariga, Masaki Nakano, Akira Sumitani, 1999, Advanced Lithography.

High-repetition-rate ArF excimer laser for microlithography

Akira Sumitani, Osamu Wakabayashi, Yasuo Itakura, 2000, International Symposium on Laser Precision Microfabrication.

Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Georg Soumagne, Tsuyoshi Yamada, Tamotsu Abe, 2020, Advanced Lithography.

Spectral measurement of ultra line-narrowed F2 laser

Toru Suzuki, Takashi Suganuma, Takanori Nakaike, 2001, SPIE Advanced Lithography.

Microprocessing of organic material for semiconductor packaging by 248 nm excimer laser

Junichi Fujimoto, Hakaru Mizoguchi, Yasufumi Kawasuji, 2019, LASE.

Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source

Takashi Suganuma, Masato Moriya, Junichi Fujimoto, 2011, Advanced Lithography.

A reliable higher power ArF laser with advanced functionality for immersion lithography

Takahito Kumazaki, Junichi Fujimoto, Shinji Okazaki, 2012, Advanced Lithography.

High-power KrF excimer laser with a solid state switch for microlithography

Osamu Wakabayashi, Yasuo Itakura, Hiroaki Nakarai, 1996, Advanced Lithography.

Wide Aperture X-Ray Preionized Excimer Laser With Variable Cross-Section Using Flat Electrodes

Hakaru Mizoguchi, Michael Steyer, Ouyang Bin, 1989, Other Conferences.

Development of 5-kHz ultra-line-narrowed F2 laser for dioptric projection system

Tatsuya Ariga, Kiyoharu Nakao, Hakaru Mizoguchi, 2003, International Symposium on High Power Laser Systems and Applications.

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2016, Advanced Lithography.

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2017, Advanced Lithography.

Recent advances of a KrF excimer laser on a plant's practical requirements

Tomokazu Takahashi, Osamu Wakabayashi, Hiroaki Nakarai, 1994, Advanced Lithography.

Performance of 250W high-power HVM LPP-EUV source

Tsuyoshi Yamada, Tamotsu Abe, Hiroshi Tanaka, 2017, Advanced Lithography.

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2015, Advanced Lithography.

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Koichi Toyoda, Hideo Hoshino, Masaki Nakano, 2007, SPIE Optical Engineering + Applications.

Development of CO2 laser produced Xe plasma EUV light source for microlithography

Koichi Toyoda, Hideo Hoshino, Tatsuya Ariga, 2006, SPIE Advanced Lithography.

Advanced spectral engineering: Lithography performance improvements by high performance light source

Takahito Kumazaki, Toshihiro Oga, Hakaru Mizoguchi, 2020 .

Performance of one hundred watt HVM LPP-EUV source

Georg Soumagne, Tsuyoshi Yamada, Tamotsu Abe, 2015, Advanced Lithography.

Small field exposure tool (SFET) light source

Georg Soumagne, Akira Sumitani, Takashi Suganuma, 2007, SPIE Advanced Lithography.

Progress of excimer laser technologies

Hakaru Mizoguchi, 2000, Other Conferences.

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Koichi Toyoda, Hideo Hoshino, Masaki Nakano, 2004, SPIE Advanced Lithography.

Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography

Tamotsu Abe, Junichi Fujimoto, Hiroaki Nakarai, 2012, Advanced Lithography.

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Tsuyoshi Yamada, Tamotsu Abe, Hiroshi Tanaka, 2014, Advanced Lithography.

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takahito Kumazaki, Takeshi Asayama, Takashi Matsunaga, 2013, Advanced Lithography.

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Shinji Nagai, Satoshi Tanaka, Junichi Fujimoto, 2008, SPIE Advanced Lithography.

Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, 2004, SPIE Advanced Lithography.

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

Satoshi Tanaka, Junichi Fujimoto, Takashi Matsunaga, 2010, Advanced Lithography.

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Georg Soumagne, Akira Sumitani, Takashi Suganuma, 2011, Advanced Lithography.

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Takahito Kumazaki, Takeshi Asayama, Takashi Matsunaga, 2014, Advanced Lithography.

Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond

Vivek Bakshi, Jos Benschop, Andrew Grenville, 2017 .

Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Hideo Hoshino, Georg Soumagne, Akira Endo, 2004, SPIE Optics + Photonics.

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Satoshi Tanaka, Junichi Fujimoto, 2008, SPIE Advanced Lithography.

Next-generation ArF laser technologies for multiple-patterning immersion lithography supporting leading edge processes

Hiroshi Tanaka, Keisuke Ishida, Hakaru Mizoguchi, 2018, Advanced Lithography.

100W EUV light-source key component technology update for HVM

Takeshi Okamoto, Tamotsu Abe, Hiroshi Tanaka, 2016, SPIE Advanced Lithography.

High peak power DUV laser processing

Taisuke Miura, Junichi Fujimoto, Hiroaki Oizumi, 2020, LASE.

Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2015, Advanced Lithography.

Key components technology update of 100W HVM EUV source

Takeshi Okamoto, Tamotsu Abe, Hiroshi Tanaka, 2015, Advanced Lithography.

Development of high coherence high power 193nm laser

Zhigang Zhao, Satoshi Tanaka, Hiroaki Oizumi, 2016, SPIE LASE.

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Koichi Toyoda, Hideo Hoshino, Masaki Nakano, 2008, SPIE Advanced Lithography.

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2017, Advanced Lithography.

Excimer laser gas usage reduction technology for semiconductor manufacturing

Takashi Matsunaga, Hakaru Mizoguchi, Hiroaki Tsushima, 2017, Advanced Lithography.

Update of development progress of the high power LPP-EUV light source using a magnetic field

Shinji Nagai, Yoshifumi Ueno, Tamotsu Abe, 2020, Advanced Lithography.

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Shinji Nagai, Takashi Saito, Hideyuki Hayashi, 2019, Advanced Lithography.

DUV high power lasers processing for glass and CFRP

Junichi Fujimoto, Hiroaki Oizumi, Hakaru Mizoguchi, 2017, Optics + Optoelectronics.

Laser-induced damage threshold by high pulse repetition rate ArF excimer laser radiation

Takahito Kumazaki, Junichi Fujimoto, Hakaru Mizoguchi, 2019, Laser Damage.

Key components development progress updates of the 250W high power LPP-EUV light source

Tamotsu Abe, Hiroshi Tanaka, Hiroaki Nakarai, 2017, Photomask Technology.

Key components development progress updates of the 250W high-power LPP-EUV light source

Yoshifumi Ueno, Tamotsu Abe, Hiroaki Nakarai, 2018, Advanced Lithography.

LPP-EUV light source development for high volume manufacturing lithography

Tsuyoshi Yamada, Tamotsu Abe, Hiroshi Tanaka, 2013, Advanced Lithography.

Development of 250W EUV light source for HVM lithography

Tamotsu Abe, Hiroshi Tanaka, Hiroaki Nakarai, 2017, 2017 China Semiconductor Technology International Conference (CSTIC).

Present status of laser-produced plasma EUV light source

Masaki Nakano, Akira Sumitani, Tamotsu Abe, 2010, Advanced Lithography.

Extremely long life excimer laser technology for multi-patterning lithography

Takahito Kumazaki, Takeshi Asayama, Hakaru Mizoguchi, 2018, Advanced Lithography.

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Georg Soumagne, Akira Endo, Akira Sumitani, 2011, Advanced Lithography.

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Hakaru Mizoguchi, Osamu Wakabayashi, 2001, SPIE Advanced Lithography.

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

Satoshi Tanaka, Hiroshi Tanaka, Junichi Fujimoto, 2011, Advanced Lithography.

Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Takahito Kumazaki, Keisuke Ishida, 2014, Advanced Lithography.

Laser produced EUV light source development for HVM

Koichi Toyoda, Hideo Hoshino, Tatsuya Ariga, 2007, SPIE Advanced Lithography.

Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Georg Soumagne, Tsuyoshi Yamada, Takashi Suganuma, 2021, Photomask Technology.

Challenge of >300W high power LPP-EUV source with long mirror lifetime-III for semiconductor HVM

Tsuyoshi Yamada, Tamotsu Abe, Hiroaki Nakarai, 2021, Advanced Lithography.

The development progress of the high power LPP-EUV light source using a magnetic field

Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi, 2021, Advanced Lithography.

Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

Junichi Fujimoto, Hakaru Mizoguchi, Tatsuya Yanagida, 2012 .

Synthesis of arbitrary pulse waveforms in QCL-seeded ns-pulse CO2 laser for optimization of an LPP EUV source.

Takashi Suganuma, Junichi Fujimoto, Hiroaki Nakarai, 2016, Optics letters.

Multiline short-pulse solid-state seeded carbon dioxide laser for extreme ultraviolet employing multipass radio frequency excited slab amplifier.

Takashi Suganuma, Junichi Fujimoto, Hakaru Mizoguchi, 2013, Optics letters.

Wavefront measurement of single-mode quantum cascade laser beam for seed application in laser-produced plasma extreme ultraviolet system.

Takashi Suganuma, Junichi Fujimoto, Hakaru Mizoguchi, 2012, Optics letters.

Studies of Photoionization Processes of Gas Mixtures for Excimer Laser Discharges

Mitsuo Maeda, Tatsuo Okada, Katsunori Muraoka, 1999 .

Advanced excimer laser technologies enable green semiconductor manufacturing

Takashi Matsunaga, Hakaru Mizoguchi, Kouji Kakizaki, 2017 .

P-77: Novel and Highly Reliable XeF and KrF Excimer Laser Annealing for Reducing the Cost of Flat Panel Display Equipment

Akiyoshi Suzuki, Junichi Fujimoto, Takashi Matsunaga, 2017 .

Spatial profiles of electron density, electron temperature, average ionic charge, and EUV emission of laser-produced Sn plasmas for EUV lithography

Hakaru Mizoguchi, Takeshi Kodama, Tatsuya Yanagida, 2017 .

Efficient multiline nanosecond pulse amplification in planar waveguide CO₂ amplifier for extreme UV laser-produced plasma source.

Akira Sumitani, Takashi Suganuma, Junichi Fujimoto, 2014, Optics letters.

Generation of 10W, 1ns Deep Ultraviolet Pulse at 193nm

Taisuke Miura, Junichi Fujimoto, Hakaru Mizoguchi, 2019, 2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC).

Spectral characteristics of quantum-cascade laser operating at 10.6 μm wavelength for a seed application in laser-produced-plasma extreme UV source.

Takashi Suganuma, Junichi Fujimoto, Akira Endo, 2012, Optics letters.

Performance of 100-W HVM LPP-EUV source

Georg Soumagne, Tsuyoshi Yamada, Tamotsu Abe, 2015 .

Development of 250W EUV light source for HVM lithography

Tsuyoshi Yamada, Tamotsu Abe, Hiroshi Tanaka, 2016, 2016 China Semiconductor Technology International Conference (CSTIC).

LPP-EUV light source development for high volume manufacturing lithography

Junichi Fujimoto, Hakaru Mizoguchi, Takashi Saitou, 2012 .

Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources

Georg Soumagne, Katsunobu Nishihara, Atsushi Sunahara, 2017, Scientific Reports.

Dynamics of Output Spectra within a Single Laser Pulse from a Line-Narrowed Excimer Laser

Tatsuo Okada, Tatsuo Enami, Hakaru Mizoguchi, 2000 .

Reduction of Acoustic Waves Induced by Discharge in High Repetition Rate ArF Excimer Laser Cavity to Obtain Narrow-Bandwidth Laser Light

Hakaru Mizoguchi, Yosuke Sakai, Takayuki Yabu, 2006 .

A sub-Watt, line-narrowing, 193-nm solid state laser operating at 6 kHz with KBBF for injection-locking ArF excimer laser systems

Junichi Fujimoto, Shinji Ito, Takashi Matsunaga, 2012 .