Chun Li

Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm.

Chunshui Jin, Liping Wang, Bo Yu, 2015, Optics letters.

Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance.

Chunshui Jin, Bo Yu, Shun Yao, 2017, Applied optics.