Ronnen Andrew Roy

Extension and source/drain design for high-performance FinFET devices

Ying Zhang, David M. Fried, Meikei Ieong, 2003 .

Lithography and fabrication processes for sub‐100 nm scale complementary metal–oxide semiconductor

Yuan Taur, J. J. Bucchignano, Shalom J. Wind, 1995 .

Strained Si CMOS (SS CMOS) technology: Opportunities and challenges

Keith A. Jenkins, Byoung Hun Lee, P. Oldiges, 2003 .