Jiro Nakamura

发表

Development of formaldehyde sensing element using porous glass impregnated with beta-diketone.

Yasuko Yamada Maruo, Masahiro Uchiyama, J. Nakamura, 2008, Talanta.

Kinetic study on CO2 photoreduction by Re complexes

Y. Ono, M. Tsuda, Y. Maruo, 2012 .

EFFECT OF OVERCOATS ON ENVIRONMENTAL STABILITY OF A CHEMICALLY AMPLIFIED POSITIVE RESIST AGAINST WATER AND ORGANIC BASES

Akinobu Tanaka, Yoshio Kawai, Hiroshi Ban, 1995 .

Influence of Acid Diffusion on the Lithographic Performance of Chemically Amplified Resists

Akinobu Tanaka, Hiroshi Ban, Jiro Nakamura, 1992 .

Effect of Substituent Groups in Rhenium Bipyridine Complexes on Photocatalytic CO2 Reduction

Masahiko Hayashi, Kazue Takahashi, M. Hayashi, 2014 .

Phantom exposures of chemically amplified resists caused by acids generated in environmental air in synchrotron radiation lithography

Masatoshi Oda, Yoshio Kawai, Makoto Fukuda, 1999 .

Development and performance evaluation of ozone detection paper using azo dye orange I: Effect of pH

Yasuko Yamada Maruo, J. Nakamura, Jiro Nakamura, 2010 .

Phantom Exposure of Chemically Amplified Resist in KrF Excimer Laser Lithography

Yoshio Kawai, Kimiyoshi Deguchi, J. Nakamura, 1999 .

EVALUATION OF ACID DIFFUSION IN CHEMICALLY AMPLIFIED RESIST USING INTERDIGITATED ARRAY ELECTRODE.

Akinobu Tanaka, Hiroshi Ban, Jiro Nakamura, 1993 .

Development and evaluation of ozone detection paper

Tatsuya Kunioka, Yasuko Yamada Maruo, J. Nakamura, 2009 .

Resist Surface Roughness Calculated using Theoretical Percolation Model.

Hiroshi Ban, Kimiyoshi Deguchi, H. Ban, 1998 .