S.J. Fonash

A study of Pd/Si MIS Schottky barrier diode hydrogen detector

S. Ashok, S. Ashok, S. Fonash, 1981, IEEE Transactions on Electron Devices.

The Nanoscale Silicon Accumulation-Mode MOSFET—A Comprehensive Numerical Study

F. Udrea, P. Migliorato, Yi Hong, 2008, IEEE Transactions on Electron Devices.

Soft-breakdown damage in MOSFET's due to high-density plasma etching exposure

M. Okandan, S.J. Fonash, O.O. Awadelkarim, 1996, IEEE Electron Device Letters.

Cyclic current-voltage characterization applied to edge damage evaluation in gate definition plasma etching

M. Okandan, J. Werking, J. Werking, 1997, IEEE Electron Device Letters.

Degradation of submicron N-channel MOSFET hot electron reliability due to edge damage from polysilicon gate plasma etching

O. Awadelkarim, S. Fonash, T. Gu, 1994, IEEE Electron Device Letters.

Impact of polysilicon dry etching on 0.5 /spl mu/m NMOS transistor performance: the presence of both plasma bombardment damage and plasma charging damage

M. Okandan, O. Awadelkarim, M. Okandan, 1994, IEEE Electron Device Letters.

Photons, Charging Currents, Hydrogen, and Particle Bombardment - The Four Horsemen of Plasma Etching

S.J. Fonash, 1996, Proceedings of 1st International Symposium on Plasma Process-Induced Damage.

Hydrogen permeation, Si defect generation, and their interaction during CHF/sub 3//O/sub 2/ contact etching

S.J. Fonash, O.O. Awadelkarim, T. Gu, 1994, IEEE Electron Device Letters.