P. Kalra

Selective phase modulation of NiSi using N-ion implantation for high performance dopant-segregated source/drain n-channel MOSFETs

Injo Ok, R. Jammy, P. Majhi, 2006, 2009 Symposium on VLSI Technology.

Band-Engineered Low PMOS VT with High-K/Metal Gates Featured in a Dual Channel CMOS Integration Scheme

Hsing-Huang Tseng, Byoung Hun Lee, R. Jammy, 2007, 2007 IEEE Symposium on VLSI Technology.

Demonstration of High-Performance PMOSFETs Using $ \hbox{Si}$–$\hbox{Si}_{x}\hbox{Ge}_{1 - x}$ –$\hbox{Si}$ Quantum Wells With High- $\kappa$/Metal-Gate Stacks

R. Jammy, P. Majhi, R. Choi, 2008, IEEE Electron Device Letters.

CMOS Scaling Beyond High-k and Metal Gates

Raj Jammy, Prashant Majhi, Jungwoo Oh, 2007 .

High Performance pMOSFETs Using Si/Si1-xGex/Si Quantum Wells with High-k/Metal Gate Stacks and Additive Uniaxial Strain for 22 nm Technology Node

R. Jammy, P. Majhi, R. Choi, 2007, 2007 IEEE International Electron Devices Meeting.