J. J. Versluijs

Gate-all-around NWFETs vs. triple-gate FinFETs: Junctionless vs. extensionless and conventional junction devices with controlled EWF modulation for multi-VT CMOS

E. Simoen, G. Hellings, E. Vecchio, 2015, 2015 Symposium on VLSI Technology (VLSI Technology).

Junctionless gate-all-around lateral and vertical nanowire FETs with simplified processing for advanced logic and analog/RF applications and scaled SRAM cells

B. Parvais, B. Kaczer, E. Simoen, 2016, 2016 IEEE Symposium on VLSI Technology.

Magnetoresistance of Half-Metallic Oxide Nanocontacts

J. M. D. Coey, J. Coey, J. Versluijs, 2001 .

Fabrication and characterisation of Ni nanocontacts

C. L. Dennis, John F. Gregg, J. M. D. Coey, 2002 .